NotesFAQContact Us
Collection
Advanced
Search Tips
Peer reviewed Peer reviewed
Direct linkDirect link
ERIC Number: EJ879321
Record Type: Journal
Publication Date: 2010-Feb
Pages: 19
Abstractor: As Provided
Reference Count: 47
ISBN: N/A
ISSN: ISSN-1479-0718
The Influence of Language Distance and Language Status on the Acquisition of L3 Phonology
Llama, Raquel; Cardoso, Walcir; Collins, Laura
International Journal of Multilingualism, v7 n1 p39-57 Feb 2010
Research in the field of third language acquisition has consistently identified two key factors which have an effect on the ways in which the two known languages may influence the acquisition of a third. These factors are language distance (typology) and language status (more specifically, second language, L2, or non-native language status). To date, however, the findings have not been conclusive regarding whether one of the two factors has a greater influence than the other. In this study, we investigated whether L2 status or typology would be the stronger predictor in the selection of a source language for phonological influence in L3 acquisition. Two groups of learners of Spanish as an L3, one with English L1 and French L2, the other with French L1 and English L2, were recorded reading word lists containing voiceless stops in onset, stressed position. Paired-samples t-tests were used to compare the rates of presence (English-influenced) or absence (French-influenced) of aspiration (operationalised as voice onset time values). Results point to L2 status as the determining factor in the selection of a source language for the production of voiceless stops in stressed onset position in L3 Spanish for both groups. (Contains 5 tables, 4 figures, and 4 notes.)
Routledge. Available from: Taylor & Francis, Ltd. 325 Chestnut Street Suite 800, Philadelphia, PA 19106. Tel: 800-354-1420; Fax: 215-625-2940; Web site: http://www.tandf.co.uk/journals
Publication Type: Journal Articles; Reports - Research
Education Level: N/A
Audience: N/A
Language: English
Sponsor: N/A
Authoring Institution: N/A