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ERIC Number: EJ799435
Record Type: Journal
Publication Date: 2008-Apr
Pages: 23
Abstractor: As Provided
Reference Count: 56
ISBN: N/A
ISSN: ISSN-1530-5058
Clarifying the Measurement of a Self-Structural Process Variable: The Case of Self-Complexity
Luo, Wenshu; Watkins, David
International Journal of Testing, v8 n2 p143-165 Apr 2008
Despite the importance of self-structural variables to understand self-processes, research in this area has been hampered by measurement problems. The current study seeks to clarify this situation by examining the interrelationships among six self-structural measures of trait-sorting data of 252 Chinese college students: the "H" statistic of self-complexity, the hierarchical attribute class number, the number of self-aspects, the overlap among self-aspects in terms of traits describing them, the average inter-aspect correlation, and the self-concept compartmentalization "Phi". It was found that "H" was highly correlated with the hierarchical attribute class number, and overlap was highly correlated with the average inter-aspect correlation. Both "H" and the hierarchical attribute class number were highly correlated with the number of self-aspects; although both the former measures were positively correlated with overlap and the average inter-aspect correlation in general, the relationships were like an inverted U curve. Self-concept compartmentalization was negatively correlated with both overlap and the average inter-aspect correlation. Four main implications of these findings lead to recommendations being made for future studies of self-structural variables, such as self-complexity, self-concept fragmentation, and self-concept compartmentalization and their relationship to well-being. (Contains 3 figures, 1 table, and 2 footnotes.)
Lawrence Erlbaum. Available from: Taylor & Francis, Ltd. 325 Chestnut Street Suite 800, Philadelphia, PA 19106. Tel: 800-354-1420; Fax: 215-625-2940; Web site: http://www.tandf.co.uk/journals/default.html
Publication Type: Journal Articles; Reports - Research
Education Level: Higher Education
Audience: N/A
Language: English
Sponsor: N/A
Authoring Institution: N/A
Identifiers - Location: China