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ERIC Number: EJ1040116
Record Type: Journal
Publication Date: 2014-Sep
Pages: 3
Abstractor: As Provided
Reference Count: 9
ISSN: ISSN-0021-9584
Simple Chemical Vapor Deposition Experiment
Pedersen, Henrik
Journal of Chemical Education, v91 n9 p1495-1497 Sep 2014
Chemical vapor deposition (CVD) is a process commonly used for the synthesis of thin films for several important technological applications, for example, microelectronics, hard coatings, and smart windows. Unfortunately, the complexity and prohibitive cost of CVD equipment makes it seldom available for undergraduate chemistry students. Here, a simple CVD experiment designed to give hands-on experience with this technique--using common chemical laboratory equipment--is outlined. The experiment is suitable for an upperlevel or graduate course on inorganic chemistry, materials chemistry or materials science. In the experiment, crystalline thin films of titanium nitride (TiN) are deposited using titanium tetrachloride, hydrogen, and nitrogen gas in an experimental setup based on a tube furnace and common safety flasks. Typically, crystalline TiN films with some incorporation of TiO[subscript 2] are deposited in this experiment. The experiment has been used in the teaching of both master and doctorial students.
Division of Chemical Education, Inc and ACS Publications Division of the American Chemical Society. 1155 Sixteenth Street NW, Washington, DC 20036. Tel: 800-227-5558; Tel: 202-872-4600; e-mail:; Web site:
Publication Type: Journal Articles; Reports - Descriptive
Education Level: Higher Education; Postsecondary Education
Audience: N/A
Language: English
Sponsor: N/A
Authoring Institution: N/A